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Magnetron Sputtering
Chamber Material: 316L Stainless Steel with Electropolishing
Chamber Base Pressure: <5E-7 Pa
1-inch Sample Stage, 3-axis Sample Translation Stage
Maximum Heating Stage Temperature: 1300 °C
3-in-1 Magnetron Sputtering Gun: CF200 Mounting Size, 3×2-inch Target Guns with Angle Adjustable Flexibly; Each Gun Equipped with Independent Gas Circuit, Baffle and Water Cooling Device
Gas Circuit Control Unit
Film Thickness Detector
DC Power Supply for Target Guns
Water Cooling System: Temperature Range 5–30 °C, Temperature Control Accuracy ±1 °C
Chamber Base Pressure: <5E-7 Pa
1-inch Sample Stage, 3-axis Sample Translation Stage
Maximum Heating Stage Temperature: 1300 °C
3-in-1 Magnetron Sputtering Gun: CF200 Mounting Size, 3×2-inch Target Guns with Angle Adjustable Flexibly; Each Gun Equipped with Independent Gas Circuit, Baffle and Water Cooling Device
Gas Circuit Control Unit
Film Thickness Detector
DC Power Supply for Target Guns
Water Cooling System: Temperature Range 5–30 °C, Temperature Control Accuracy ±1 °C
Detail
✔ After receiving the information, our sales staff/product engineers will contact you.
✔ Some products can be customized according to your requirements.
✔ Your information will be kept confidential throughout the entire process.
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Phone：0551-63637062